| dc.contributor.author |
Hong H. Lee |
|
| dc.coverage.spatial |
New York |
|
| dc.coverage.temporal |
1990 |
|
| dc.date.accessioned |
2018-10-16T06:36:32Z |
|
| dc.date.available |
2018-10-16T06:36:32Z |
|
| dc.date.issued |
2018-10-04 |
|
| dc.identifier.isbn |
0070370567 |
|
| dc.identifier.uri |
http://hdl.handle.net/123456789/101 |
|
| dc.description.tableofcontents |
Integrated Circuits and Fabrication--Silicon Refining and Other Raw Materials--Bulk Crystal Growth--Electrical Characteristics of Processed Materials--Chemical Rate Processes and Kinetics--Chemical Vapor Deposition Reactors--Incorporation and Transport of Dopants--Pattern Generation, Transfer, and Delineation--Physical and Physicochemical Rate Processes--Physical Vapor Deposition Apparatuses--Packaging--Appendix Tables--Acknowledgements |
th |
| dc.language.iso |
en_US |
th |
| dc.publisher |
McGraw-Hill Education |
th |
| dc.relation.ispartofseries |
McGraw-Hill Chemical Engineering Series; |
|
| dc.subject |
Integrated |
th |
| dc.subject |
Integrated circuits-Design and construction |
th |
| dc.title |
Fundamentals of Microelectronics Processing |
th |
| dc.type |
Book |
th |
| dc.creator.orgname |
University of Florida |
|
| dc.description.note |
514 pages, Illustrations, Bibliographies, Index |
|
| dc.rights.access |
Available |
|
| dc.identifier.callno |
TK7874 LEE 1990 |
|