Fundamentals of Microelectronics Processing

Please use this identifier to cite or link to this item: https://modps71.lib.kmutt.ac.th/xmlui//handle/123456789/101

Full metadata record

DC Field	Value	Language
dc.contributor.author	Hong H. Lee
dc.coverage.spatial	New York
dc.coverage.temporal	1990
dc.date.accessioned	2018-10-16T06:36:32Z
dc.date.available	2018-10-16T06:36:32Z
dc.date.issued	2018-10-04
dc.identifier.isbn	0070370567
dc.identifier.uri	http://hdl.handle.net/123456789/101
dc.description.tableofcontents	Integrated Circuits and Fabrication--Silicon Refining and Other Raw Materials--Bulk Crystal Growth--Electrical Characteristics of Processed Materials--Chemical Rate Processes and Kinetics--Chemical Vapor Deposition Reactors--Incorporation and Transport of Dopants--Pattern Generation, Transfer, and Delineation--Physical and Physicochemical Rate Processes--Physical Vapor Deposition Apparatuses--Packaging--Appendix Tables--Acknowledgements	th
dc.language.iso	en_US	th
dc.publisher	McGraw-Hill Education	th
dc.relation.ispartofseries	McGraw-Hill Chemical Engineering Series;
dc.subject	Integrated	th
dc.subject	Integrated circuits-Design and construction	th
dc.title	Fundamentals of Microelectronics Processing	th
dc.type	Book	th
dc.creator.orgname	University of Florida
dc.description.note	514 pages, Illustrations, Bibliographies, Index
dc.rights.access	Available
dc.identifier.callno	TK7874 LEE 1990
Appears in Collections:	Executive Collection

Files in This Item:

There are no files associated with this item.